JPH0160766B2 - - Google Patents
Info
- Publication number
- JPH0160766B2 JPH0160766B2 JP56079225A JP7922581A JPH0160766B2 JP H0160766 B2 JPH0160766 B2 JP H0160766B2 JP 56079225 A JP56079225 A JP 56079225A JP 7922581 A JP7922581 A JP 7922581A JP H0160766 B2 JPH0160766 B2 JP H0160766B2
- Authority
- JP
- Japan
- Prior art keywords
- circuit
- positional deviation
- edge
- picture elements
- binary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7922581A JPS57194304A (en) | 1981-05-27 | 1981-05-27 | Inspecting method for circuit pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7922581A JPS57194304A (en) | 1981-05-27 | 1981-05-27 | Inspecting method for circuit pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57194304A JPS57194304A (en) | 1982-11-29 |
JPH0160766B2 true JPH0160766B2 (en]) | 1989-12-25 |
Family
ID=13683959
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7922581A Granted JPS57194304A (en) | 1981-05-27 | 1981-05-27 | Inspecting method for circuit pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57194304A (en]) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59157505A (ja) * | 1983-02-28 | 1984-09-06 | Hitachi Ltd | パタ−ン検査装置 |
JPS6057929A (ja) * | 1983-09-09 | 1985-04-03 | Hitachi Ltd | パターン欠陥検出装置 |
JPS60233503A (ja) * | 1984-05-02 | 1985-11-20 | Matsushita Electric Works Ltd | 位置検出方法 |
JPS61168293A (ja) * | 1985-01-22 | 1986-07-29 | 日本電気株式会社 | 多層配線基板 |
JPS61251705A (ja) * | 1985-04-30 | 1986-11-08 | Sumitomo Metal Ind Ltd | パタ−ン検査方法及び装置 |
KR100526035B1 (ko) * | 2003-05-07 | 2005-11-08 | 홍성국 | 메탈 마스크 검사 장치 및 그의 검사 방법 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6043657B2 (ja) * | 1975-08-22 | 1985-09-30 | 株式会社日立製作所 | 物体状態検査方法 |
JPS5381153A (en) * | 1976-12-27 | 1978-07-18 | Hitachi Ltd | Inspecting apparatus for positions of object to be inspected |
-
1981
- 1981-05-27 JP JP7922581A patent/JPS57194304A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57194304A (en) | 1982-11-29 |
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